Today, electron beam (EB) systems have become a widely used method of manufacture. They are recognized for their ease of handling, operation and focus on safety. Electron beam processing can be done under vacuum, partial vacuum or nonvacuum conditions. High-vacuum conditions result in fewer gaseous molecules between the electron lamp and the targeted substrate, which results in less scattering and a tighter beam.
Low-energy EB technology is defined as beam operations with an accelerating voltage of less than 300 kV. Low-energy EB is used in many surface curing, crosslinking, scission, grafting and surface sterilization applications. Low-energy EB systems also use tungsten filaments to generate an ongoing stream of electrons under vacuum that are propelled through a titanium foil window onto a targeted substrate. Standard, commercial low-energy EB systems range from 30" (762 mm) to 108" (2743 mm) in width, depending on the design width of the electron beam. In the field of narrow web processing, the sealed low-energy ebeam lamps range in window width from 220 mm to 400 mm. Vacuum pumps are not needed for compact, sealed ebeam systems, which do not require filament or foil replacement. Like a light bulb, ebeam lamps are replaced in full as a spare part. This is a crucial benefit in applications where service time is vital.