Qinghuang Lin Wins 2020 Roy W. Tess Award in Coatings
WASHINGTON — Dr. Qinghuang Lin, a recognized engineer of polymers and electronic materials, has been named the winner of the Roy W. Tess Award in Coatings for 2020. For more than 20 years, Dr. Lin has made important contributions to the field of advanced photoresist coatings for modern electronics. His seminal contributions are related to polymer coatings, a class of photosensitive polymeric electronic materials, called photoresists, used to “print” modern integrated circuits or microchips. The Officers and the Award Committee of the Division of Polymeric Materials: Science and Engineering (PMSE) of the American Chemical Society (ACS) announced the award.
Dr. Lin has spent most of his professional career at IBM. Most recently he was a Senior Manager and a Research Staff Member at the IBM Thomas J. Watson Research Center in Yorktown Heights, New York. He received his B.E. degree and his M.S. degree from Tsinghua University, Beijing, China and his Ph.D. degree from the University of Michigan at Ann Arbor. He was a post-doctoral fellow at the University of Texas at Austin prior to joining IBM. His research interests center on electronic materials for nanofabrication and integration of devices and systems as well as the applications of these devices and systems in computing, bioelectronics, life sciences and healthcare.