NEW YORK, NY - Columbia University in New York City will host a rare convergence of two international groups of colloid and surface scientists in June 2009 at its Morningside campus. The triennial 13th International Conference on Surface and Colloid Science originating from the International Association of Colloid and Interface Scientists will occur jointly with the annual 83rd Colloid and Surface Science Symposium originating from the American Chemical Society. This confluence will bring together top researchers and technologists spanning the wide range of topics that come under the umbrella of colloid and surface science. “We are inviting papers on a variety of topics in colloids and surfaces," said Dr. Raymond Farinato, Conference Chair.
"We hope to attract not only academic researchers but high-caliber scientists from the chemical, biotechnology, pharmaceutical, materials, green engineering, microelectronics, mineral processing and nanotechnology industries.”
The conference and symposium will take place June 14-19, 2009, at Columbia University, New York, NY. For abstract submission and registration, visit or telephone 212/854.8812.