More than 2,700 people attended RadTech's biennial e|5: UV & EB Technology Expo & Conference, April 24-26 2006, at McCormick Place, Chicago, Ill., which was a record for the event. "With rising energy costs, increasing international competition, and continuing environmental concerns, manufacturers are increasingly looking to ultraviolet (UV) and electron beam (EB) technology to address these challenges," said David Harbourne, RadTech president and president of Fusion UV.
The e|5 conference included 40 sessions and 150 presentations developed in separate tracks for user and technical suppliers. The event's Best Technical Paper was awarded to Dr. Tom Scherzer of the Leibniz Institute of Surface Modification, while the Best Student Technical Paper award went to Vien Lam of the University of Houston-Downtown for "UV-Polymerizable Systems Containing Single-Walled Carbon Nanotubes (SWNTs)."
For more information, visitwww.radtech.org.
e|5 Sees Record Attendance
July 1, 2006