Science and Technology Conference Reports Large Turnout
NEW YORK, NY - Columbia University in New York City hosted a rare convergence of two international groups of colloid and surface scientists from June 14 to June 19, 2009, at its Morningside campus. The triennial 13th International Conference on Surface and Colloid Science originating from the International Association of Colloid and Interface Scientists occurred jointly with the annual 83rd Colloid and Surface Science Symposium originating from the American Chemical Society. The confluence brought together top researchers and technologists spanning the wide range of topics that come under the umbrella of colloid and surface science. The conference had record attendance, with over 1,200 delegates from 40 countries attending.